Yokogawa’s new TDLS8000 houses all of the industry’s leading features in one robust device. The platform design is for in situ measurements that eliminate the need for sample extraction and conditioning. The non-contacting sensor allows for a variety of process types including corrosive, abrasive, and condensing.
The first generation platform has been proven in many others for the measurements of O2, CO, CH4, NH3, H2O and many more NIR absorbing gases. This second generation platform has improved reliability and ease of installation and maintenance while still meeting or exceeding designed application demands.
The most trusted laser analyzer designed specifically to meet all of your requirements in one robust device that is easy to operate and maintain.
Standard System Configuration
HART communication available
System Configuration with HMI
Multi Analyzer Configuration with Remote HMI
Up to 4 units connection available
Internal reference cell in the laser module ensures peak locking during trace measurement.
Auto-gain enables wide signal ranges against dynamic variation of transmission.
Validation can be initiated manually, remotely, or automatically on a daily, weekly or monthly basis defined by the user.
IEC61508 SIL designed & approved, SIL2 capability for single analyzer use, SIL3 capability for dual analyzer use.
The TruePeak we can measure the area of the absorbance peak. This eliminates effects from changing background gases, allowing for simple pressure and temperature compensation.
Touch screen 7.5 inch color LCD on HMI
Optical transmission at both the ends for easy alignment
|Measurement object||O2, CO, CO or CH4, CO2, CO + CO2, H2O, NH3, NH3 + H2O, H2S, HCl concentration in combustion exhaust gas and process gas|
|Measurement system||Tunable diode laser spectroscopy|
|Measured components and range||Measured component||Min. range||Max. range|
|CO(ppm)||0-200 ppm||0-10,000 ppm|
|CO+CH4||CO||0-200 ppm||0-10,000 ppm|
|NH3||0-30 ppm||0-50,000 ppm|
|H2O (ppm) in non HC||0-30 ppm||0-30,000 ppm|
|H2O (ppm) in HC||0-30 ppm||0-30,000 ppm|
|CO (%)||0-20 %||0-50 %|
|CO (%) + CO2 (%)||0-30 %||0-100 %|
|NH3 + H2O||NH3||0-30 ppm||0-5,000 ppm|
|H2O||0-5 %||0-50 %|
|H2S||0-5 %||0-100 %|
|CO2 (%) High Range||0-1 %||0-5 %|
|CO2 (%) Extend.Range||0-30 %||0-50 %|
|H2O (%)||0-10 %||0-100 %|
|HCl||0-50 ppm||0-5,000 ppm|
|Output path length||Optical distance between the laser unit and the sensor control unit Standard; 0.5 to 6 m, Max; 30 m|
|Output signal||2 points, 4 to 20 mA DC
Output types; Gas concentration, Transmission, Process gas temperature, Process gas pressure
Output range; 3.0 to 21.6 mA DC
|Digital communication||HART, Ethernet|
|Contact outputs||2 points, contact rating 24 V DC, 1 A
Function: Activate during Warning / Calibration / Validation / Warm up / Maintenance conditions
Function: Activate during normal condition, not activate during fault condition or when the system power is off
|Valve control output||2 points
Function; Activate calibration or validation solenoid valves for zero, span or validation gas
Output signal; 24 V DC, 500 mA Max. per terminal
Gas concentration low/high, Transmission low, Process pressure low/high, Process temperature low/high, Validation required, Validation failure, Zero/Span calibration error, Non process alarm, External alarm
Laser module temperature low/high, Laser temperature low/high, Detector signal high, Peak center out of range, Reference peak height low, Absorption too high, Transmission lost, Reference transmission low, Reference peak height high, Laser unit failure, Laser module error, File access error, E2PROM access error.
External alarm/Calibration start/Validation start/Stream switch
Zero voltage contact input
Input signal; Open signal;
100 kΩ or more, Close signal; 200 Ω or less
|2 points, 4 to 24 mA DC
Input types; Process gas temperature, Process gas pressure
|Self-diagnostics||Laser Unit temperature, Sensor Control Unit temperature, Laser temperature, Detector signal level, Memory read/write function, Peak locking condition|
|Calibration||Calibration method; Zero/Span calibration
Calibration mode; Manual, Auto, Local initiate (HMI)
|Validation||Validation method; Up to 2 points
Validation mode; Manual, Auto, Local initiate (HMI)
|Power supply||24 V DC ±10%|
|Warm-up time||5 min.|
|Protection degree||IP66, NEMA Type 4X|
|Hazardous area classifications||Division 1, Zone 1; Explosion-proof/ Flame-proof type; FM, cFM, ATEX, IECEx (Pending)
Division 2, Zone 2; Non-Incendive/Type n; FM, cFM, ATEX, IECEx
|Process gas condition||Process gas temperature; Maximum 1500℃
Process gas pressure; Max. 1 MPa, Min. 90 kPa
Dust in process gas; 20 g/m3 or less
|Installation condition||Ambient operating temperature; -20 to 55℃
Storage temperature; -30 to 70℃
Humidity; 0 to 95%RH at 40℃ (Non-condensing)
Mounting flange type; ASME B 16.5, DIN, JIS
Gas connections; 1/4 NPT or Rc1/4
Recommended purge gasses
O2 analyzer; N2 (99.99% or greater, application dependent)
H2O ppm analyzer; N2 (99.99% or greater with < 20 ppm H2O for feed to the optional dryer package)
CO, CO or CH4, CO2, CO+CO2, NH3, NH3+H2O, H2S, HCl;
N2 (99.99% or greater, application dependent) or Instrument air CO, NH3 analyzer: N2 (99.99% or greater, application dependent) or Instrument air
Purge gas flow rates;
5-20 L/min for optic
5-30 L/min for process window
Purge gas connections;
1/4NPT (-G1, -C2, -D2, -C2, -D1, -C1),
Rc1/4 (-G2, -S2, -E2, -J2, -E1, -J1)
|O2||± 1% reading or ± 0.01% O2, whichever is greater||± 1% F.S.|
|CO (ppm)||± 2% reading or ± 1 ppm CO, whichever is greater||± 1% F.S.|
|CO + CH4||CO||± 1% reading or ± 1 ppm CO, whichever is greater||± 2% F.S.|
|CH4||± 4% reading or ± 0.02% CH4, whichever is greater||± 4% F.S.|
|NH3||± 2% reading or ± 1 ppm NH3, whichever is greater||± 2% F.S.|
|H2O (ppm) in non
|± 2% reading or ± 0.1 ppm H2O, whichever is greater||± 1% F.S.|
|H2O (ppm) in HC||± 2% reading or ± 0.1 ppm H2O, whichever is greater||± 1% F.S.|
|CO (%)||± 1% reading or ± 0.01% CO, whichever is greater||± 1% F.S.|
|CO (%) + CO2 (%)||CO||± 1% reading or ± 0.1% CO, whichever is greater||± 1% F.S.|
|CO2||± 1% reading or ± 0.1% CO2, whichever is greater||± 1% F.S.|
|NH3 + H2O||NH3||± 2% reading or ± 1 ppm NH3, whichever is greater||± 2% F.S.|
|H2O||± 4% reading or ± 0.05% H2O, whichever is greater||± 2% F.S.|
|H2S||± 1% reading or ± 0.005% H2S, whichever is greater||± 1% F.S.|
|CO2 (%) High Range||± 1% reading or ± 0.005% CO2, whichever is greater||± 1% F.S.|
|CO2 (%) Extend. Range||± 1% reading or ± 0.02% CO2, whichever is greater||± 1% F.S.|
|H2O (%)||± 1% reading or ± 0.004% H2O, whichever is greater||± 1% F.S.|
|HCL||± 1% reading or ± 2.5 ppm H2O, whichever is greater||± 2% F.S.|
The YH8000 is a HMI designed specifically for the Tunable Diode Laser Gas Analyzer, the TDLS8000.
|Display||Touchscreen 7.5 inch TFT color LCD panel, 640 x 480 (VGA)|
|Communication||Ethernet; RJ-45 connector, Communication speed; 100 Mbps|
|IP65, NEMA Type 4X|
|Mounting||Analyzer mount (Front, left-side, right-side) with tilt function, Pipe mount or Panel mount|
|Cable Entries||1/2NPT or M20 x 2|
|Ambient operating temperature; -20 to 55℃
Storage temperature: -30 to 70℃
Humidity: 10 to 90%RH at 40℃ (Noncondensing)
|Power Supply||24 V DC ±10%|
|Division 2, Zone2: Non-Incendive/Type n; FM, cFM, ATEX, IECEx|
The simple and robust TDLS8000 assures the reliable and less maintenance operation of the analysis.
Yokogawa TDSL8000 and CO + CH4 measurements provide reliable information to achieve:
O2 Measurement for Safety and Process Monitoring & Control Yokogawa TDLS8000 02 analyzer achieves:
In maintaining and managing industrial plants, monitoring waste water pH/ORP is both a legal obligation and an unavoidable necessity for protecting the environment. Monitoring without an attentive eye can lead to severe consequences.
Considering safety and environmental issues such as combustion efficiency and decreasing NOX and CO in exhaust gas, it has become important to control O2 concentration in garbage incineration processes.
The ammonia (NH3) gas is injected to remove the NOx and thus reduce the NOx concentration in the stack flue gas. With conventional NH3 analyzers that perform measurements indirectly, NH3 concentrations are obtained through a sampling system. Therefore, there are problems with the maintenance and running costs of the sampling system, and time delays in measurement. The TDLS8000 Laser Analyzer is the solution to all these problems.
O2 measurement in hydrocarbon vapor is used for safety monitoring in vacuum distillation columns in petroleum refining. With conventional paramagnetic oxygen analyzers, O2 concentrations are obtained through an extractive sampling system, which conditions the sample prior to being analyzed.
O2 measurement is used to safely recover flue gas containing a high concentration of CO from a converter furnace. With conventional paramagnetic oxygen analyzers, O2 concentrations are obtained through a sampling system to recovery flue gas. Therefore, there are problems with the maintenance and running costs of the sampling system, and time delays in measurement.
Spectrometric technology can assess many critical characteristics about products, but it has limits. It can be challenging to determine when the line has been crossed
With fired heaters, users hope to get greater efficiency and reduced emissions but often are disappointed. Given the number of fired heaters operating every day and their importance in the process industries, any improvements realized across the board will have huge impacts. More units can reach their potential with some simple changes in work practices and technology upgrades.
Yokogawa’s new TDLS8000 houses all of the industry’s leading features in one robust device. The platform design is for in situ measurements which negate the need for sample extraction and conditioning. The non-contacting sensor allows for a variety of process types including corrosive, abrasive and condensing. The first generation platform has been proven in many others for the measurements of O2, CO, CH4, NH3, H2O and many more NIR absorbing gases. This second generation platform has improved reliability and ease of installation and maintenance while still meeting or exceeding designed application demands.
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